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The cleaning principle of the plasma cleaning machine

Author: Shenzhen three and wave of Electrical and Mechanical Technology Co., LtdIssuing Time:2017-08-03 09:03:15Pageviews:1671smallmediumbig

Plasma is a state of existence of matter, usually in solid, liquid, gaseous three states exist, but in some special circumstances there is a fourth state exists, such as the Earth\'s atmosphere in the ionosphere of the material. The presence of the following substances in the plasma state: electrons in a high-speed sta...
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Plasma is a state of existence of matter, usually in solid, liquid, gaseous three states exist, but in some special circumstances there is a fourth state exists, such as the Earth's atmosphere in the ionosphere of the material. The presence of the following substances in the plasma state: electrons in a high-speed state of motion; neutral atoms, molecules, radicals (radicals) in the active state; ionized atoms, molecules; unreacted molecules, atoms, etc. Still remain neutral state.

In the vacuum chamber, the RF power source produces a high-energy disordered plasma at a certain pressure, and the surface of the product is cleaned by plasma bombardment. To achieve the purpose of cleaning.
2017-08-03 1671People browse

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Shenzhen three and wave of Electrical and Mechanical Technology Co., Ltd
Contact:Mr. Xie
Mobile:136 0019 4271
Tel:0755 814 78611
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Address:Shenzhen Longhua New District Shixiang Industrial Zone Hongde Industrial Building C, 3rd Floor, 308

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